Object
Title: Changes in resistivity of giass containing cerium to ionizing radiation after photothermal processing
Creator:
Gębala, Stanisław ; Rysiakiewicz, Ewa
Contributor:
Description:
Optica Applicata is an international journal, published in a non-periodical form in the years 1971-1973 and quarterly since 1973. From the beginning of the year 2008, Optica Applicata is an Open Access journal available online via the Internet, with free access to the full text of articles serving the best interests of the scientific community. The journal is abstracted and indexed in: Chemical Abstracts, Compendex, Current Contents, Inspec, Referativnyj Zhurnal, SCI Expanded, Scopus, Ulrich’s Periodicals Directory ; click here to follow the link ; Optica Applicata, Vol. 8, 1978, nr 4, s. 149-154
Publisher:
Oficyna Wydawnicza Politechniki Wrocławskiej
Place of publication:
Date:
Resource Type:
Resource Identifier:
Source:
<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link
Language:
Relation:
Optica Applicata ; Optica Applicata, Vol. 8, 1978 ; Optica Applicata, Vol. 8, 1978, nr 4 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki
Rights:
Wszystkie prawa zastrzeżone (Copyright)
Access Rights:
Dla wszystkich w zakresie dozwolonego użytku
Location:
Object collections:
- Lower Silesian Digital Library > Participants of the Consortium > 01. Wrocław University of Science and Technology > Journals WUoT > Journals published at Wrocław University of Technology > Optica Applicata
- Lower Silesian Digital Library > Resources > 2. Czasopisma > Czasopisma współczesne
- Lower Silesian Digital Library > Fields of science > 6. Nauki ścisłe i przyrodnicze
Last modified:
Jan 16, 2019
In our library since:
Jun 12, 2018
Number of object content hits:
20
Number of object content views in PDF format
12
All available object's versions:
https://dbc.wroc.pl./publication/53462
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Show description in OAI-PMH format:
| Edition name | Date |
|---|---|
| Changes in resistivity of glass containing cerium to ionizing radiation after photothermal processing | Jan 16, 2019 |
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