Object

Planned object

Title: Control of optical chaos spectrum in semiconductor laser for secure RoF communication

Creator:

Mazhar, Danish Ali ; Ali, Syed Zafar ; Islam, Muhammad Khawar

Contributor:

Urbańczyk, Wacław. Redakcja

Description:

Optica Applicata, Vol. 52, 2022, nr 4, s. 485-495 ; Optica Applicata is an international journal, published in a non-periodical form in the years 1971-1973 and quarterly since 1973. From the beginning of the year 2008, Optica Applicata is an Open Access journal available online via the Internet, with free access to the full text of articles serving the best interests of the scientific community. The journal is abstracted and indexed in: Chemical Abstracts, Compendex, Current Contents, Inspec, Referativnyj Zhurnal, SCI Expanded, Scopus, Ulrich’s Periodicals Directory ; click here to follow the link

Abstrakt:

A critical requirement in optical chaos based secure radio over fiber (RoF) system design is the ability to control center frequency, spectral bandwidth, power level and signature of chaos to submerge message with sufficient horizontal and vertical margins both in time and frequency domains. Once frequency domain masking is completely achieved, time domain masking is met automatically, the former being more stringent. In a direct modulated semiconductor laser, the three control parameters are bias current (Ibias), modulation current (Imod) and modulation frequency (ωa). It is found that Imod increases bandwidth and amplitude dynamic range of chaotic pulses. Ibias increases the cavity power and hence average peak amplitude of laser chaotic pulses. The modulation frequency increases the speed of overall cavity dynamics and hence is used to increase the bandwidth of chaos but a corresponding increase in bias and modulation currents is required to support high repetition pulses. The results show relationship between three control parameters (bias current, modulation current and modulation frequency) in a direct modulated semiconductor laser and optical chaos bandwidth using regression.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2022

Resource Type:

artykuł

Resource Identifier:

doi:10.37190/oa220401

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 52, 2022 ; Optica Applicata, Vol. 52, 2022, nr 4 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska

Group publication title:

Optica Applicata

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