Title:

Real-time mask-division technique based on DMD digital lithography

Group publication title:

Optica Applicata

Creator:

Luo, Ningning ; Gao, Yiqing ; Chen, Min ; Yu, Lixia ; Ye, Qing

Contributor:

Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja

Subject and Keywords:

optyka ; digital lithography technique ; mask-division technique ; DMD-based lithography ; edge sharpness

Description:

Optica Applicata, Vol. 40, 2010, nr 1, s. 239-248

Abstrakt:

Digital lithography technique is a promising tool for the fabrication of binary optical element. In this paper, we present the mask-division technique to improve the lithography quality. A piece of high-frequency mask is divided into several pieces of low-frequency binary masks. Then they are imaged on the photoresist successively by using the DMD-based lithography system. Based on the theory of partial coherent light, the intensity distribution in image plane has been simulated. The grating masks with period of 4 μm have been fabricated by using the mask-division technique. Experimental results demonstrate the feasibility of the proposed method as an effective technique for advancing the edge sharpness.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2010

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 40, 2010 ; Optica Applicata, Vol. 40, 2010, nr 1 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska