Title:

Influence of post annealing on optical and structural properties of Eu and Pd-doped TiO2 thin films

Group publication title:

Optica Applicata

Creator:

Domaradzki, Jarosław ; Borkowska, Agnieszka ; Kaczmarek, Danuta ; Podhorodecki, Artur ; Misiewicz, Jan

Contributor:

Gaj, Miron. Redakcja

Subject and Keywords:

optyka ; transparent oxide semiconductor ; thin film ; magnetron sputtering ; titanium oxide ; europium ; palladium

Description:

Optica Applicata, Vol. 37, 2007, nr 1-2, s. 51-56

Abstrakt:

This work presents optical and structural characterization of europium and palladium doped titanium dioxide thin films prepared by modified magnetron sputtering. The metallic Eu and Pd dopants have been co-sputtered from a base Ti target (mosaic target) and deposited on SiO2 substrates. After the deposition samples were additionally annealed in air ambient for 2 hours at the temperatures of 200 °C, 400 °C, 600 °C and 800 °C, respectively. Structural properties of TiO2:(Eu, Pd) thin films were examined using X-ray diffraction (XRD). XRD patterns recorded after thermal treatment showed the dominating TiO2-rutile phase, independently of the temperature of annealing. Optical properties were studied as defined by optical transmission. It has been shown, that doping shifts the fundamental absorption edge of TiO2 toward the longer wavelength range. As the samples were additionally annealed the band gap widening has been observed from 1.7 eV, for as deposited sample up to 2.31 eV for those annealed at 800 °C.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2007

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 37, 2007 ; Optica Applicata, Vol. 37, 2007, nr1-2 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska